Polarization-independent etching of fused silica based on electrons dynamics control by shaped femtosecond pulse trains for microchannel fabrication

X. Yan, L. Jiang, X. Li, K. Zhang, B. Xia, P. Liu, L. Qu, Y. Lu

Research output: Contribution to journalArticle

13 Scopus citations


We propose an approach to realize polarization-independent etching of fused silica by using temporally shaped femtosecond pulse trains to control the localized transient electrons dynamics. Instead of nanograting formation using traditional unshaped pulses, for the pulse delay of pulse trains larger than 1 ps, coherent field-vector-related coupling is not possible and field orientation is lost. The exponential growth of the periodic structures is interrupted. In this case, disordered and interconnected nanostructures are formed, which is probably the main reason of etching independence on the laser polarization. As an application example, square-wave-shaped and arc-shaped microchannels are fabricated by using pulse trains to demonstrate the advantage of the proposed method in fabricating high-aspect-ratio and three-dimensional microchannels.

Original languageEnglish (US)
Pages (from-to)5240-5243
Number of pages4
JournalOptics Letters
Issue number17
StatePublished - Jan 1 2014


ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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