Pulsed laser deposition of HTSC thallium films

N. J. Ianno, J. A. Woollam, S. H. Liou, D. Thompson, B. Johs

Research output: Contribution to journalArticlepeer-review

Abstract

Pulsed laser deposition is a technique commonly used to deposit high quality thin films of high temperature superconductors. We discuss the results obtained when this technique is applied to the deposition of Tl-CA-Ba-Cu-O thin films using a frequency doubled Nd:YAG laser operating at 532 nm and an excimer laser operating at 248 nm. Films with onset temperatures of 125 K and zero resistance temperatures of 110 K deposited on (100) oriented MgO from a composite Tl2-Ca2-Ba2-Cu3O target were obtained at both wavelengths upon appropriate post deposition annealing. We will discuss the microstructure and composition as a function of laser wavelength and annealing conditions.

Original languageEnglish (US)
Pages (from-to)66-74
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1187
DOIs
StatePublished - Mar 19 1990

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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