Rapid fabrication of graphene on dielectric substrates via solid-phase processes

W. Xiong, Y. S. Zhou, W. J. Hou, Y. F. Lu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

To unleash the full potential of graphene in functional devices, high-quality graphene sheets and patterns are frequently required to be deposited on dielectric substrates. However, it generally calls for post-growth catalyst etching and graphene transfer steps in currently existing approaches, which are very time consuming and costly for fabricating functional graphene devices. We developed a rapid and cost-effective growth method to achieve the graphene formation directly on various kinds of dielectric substrates via a novel solid-phase transformation mechanism based on Ni/C thin films. High-quality graphene was obtained uniformly on whole surface of wafers with a controlled number of graphene layers. The monolayer graphene, as obtained, exhibits a low sheet resistance of about 50 Ω/sq and a high optical transmittance of 95.8% at 550 nm. Graphene patterns were successfully fabricated simply by either conventional photolithography or laser direct writing techniques. Various graphene patterns, including texts, spirals, line arrays, and even large-scale integrated circuit patterns, with a feature line width of 800 nm and a low sheet resistance of 205 ohm/sq, were achieved. The developed method provides a facile and cost-effective way to fabricate complex and high-quality graphene patterns directly on target substrates, which opens a door for fabricating various advanced optoelectronic devices.

Original languageEnglish (US)
Title of host publicationSynthesis and Photonics of Nanoscale Materials XII
EditorsJan J. Dubowski, David B. Geohegan, Andrei V. Kabashin
PublisherSPIE
ISBN (Electronic)9781628414424
DOIs
StatePublished - 2015
EventSynthesis and Photonics of Nanoscale Materials XII - San Francisco, United States
Duration: Feb 8 2015Feb 10 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9352
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherSynthesis and Photonics of Nanoscale Materials XII
CountryUnited States
CitySan Francisco
Period2/8/152/10/15

Keywords

  • Graphene
  • graphene patterns
  • laser direct writing
  • rapid thermal annealing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Xiong, W., Zhou, Y. S., Hou, W. J., & Lu, Y. F. (2015). Rapid fabrication of graphene on dielectric substrates via solid-phase processes. In J. J. Dubowski, D. B. Geohegan, & A. V. Kabashin (Eds.), Synthesis and Photonics of Nanoscale Materials XII [93520N] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9352). SPIE. https://doi.org/10.1117/12.2080691