Recent developments in spectroscopic ellipsometry for in situ applications

Blaine Johs, Jeff Hale, N. J. Ianno, Craig M. Herzinger, Tom Tiwald, John A. Woollam

Research output: Contribution to journalArticle

39 Scopus citations

Abstract

The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190 - 1700nm, or 0.73 - 6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.

Original languageEnglish (US)
Pages (from-to)41-57
Number of pages17
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4449
DOIs
StatePublished - Jan 1 2001

Keywords

  • Ellipsometry
  • In situ
  • Process control
  • Real-time
  • Spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Recent developments in spectroscopic ellipsometry for in situ applications'. Together they form a unique fingerprint.

  • Cite this