Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control

J. N. Hilfiker; B. Johs; J. Hale; C. M. Herzinger; T. E. Tiwald; C. L. Bungay; R. A. Synowicki; G. K. Pribil; J. A. Woollam

Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control

J. N. Hilfiker, B. Johs, J. Hale, C. M. Herzinger, T. E. Tiwald, C. L. Bungay, R. A. Synowicki, G. K. Pribil, J. A. Woollam

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

Spectroscopic Ellipsometry (SE) has become a routine characterization technique for many coatings and substrate materials. It allows non-contact and nondestructive measurement of film thickness and complex index of refraction. New instrumentation has focused on measurement accuracy, speed, and spectral coverage. This includes extension of SE into the vacuum ultraviolet and infrared. Software advances have led to integration of SE for real-time monitoring (in situ) and control of both deposition and etch processes. In situ characterization provides many advantages for optically variable coatings or multi-layer stacks. Advancement in the area of anisotropic modeling has led to characterization of anisotropic polymers used in liquid crystal displays and web coating. This talk will survey the most recent SE developments.

Original language	English (US)
Pages (from-to)	365-370
Number of pages	6
Journal	Proceedings, Annual Technical Conference - Society of Vacuum Coaters
State	Published - 2003
Externally published	Yes
Event	46th Annual Technical Conference Proceedings - San Francisco, CA, United States Duration: May 3 2003 → May 8 2003

Keywords

Film thickness
Index of refraction
Monitoring (in-situ)
Web coating process monitoring

ASJC Scopus subject areas

Mechanical Engineering
Surfaces and Interfaces
Fluid Flow and Transfer Processes
Surfaces, Coatings and Films

Cite this

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title = "Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control",

abstract = "Spectroscopic Ellipsometry (SE) has become a routine characterization technique for many coatings and substrate materials. It allows non-contact and nondestructive measurement of film thickness and complex index of refraction. New instrumentation has focused on measurement accuracy, speed, and spectral coverage. This includes extension of SE into the vacuum ultraviolet and infrared. Software advances have led to integration of SE for real-time monitoring (in situ) and control of both deposition and etch processes. In situ characterization provides many advantages for optically variable coatings or multi-layer stacks. Advancement in the area of anisotropic modeling has led to characterization of anisotropic polymers used in liquid crystal displays and web coating. This talk will survey the most recent SE developments.",

keywords = "Film thickness, Index of refraction, Monitoring (in-situ), Web coating process monitoring",

author = "Hilfiker, {J. N.} and B. Johs and J. Hale and Herzinger, {C. M.} and Tiwald, {T. E.} and Bungay, {C. L.} and Synowicki, {R. A.} and Pribil, {G. K.} and Woollam, {J. A.}",

year = "2003",

language = "English (US)",

pages = "365--370",

journal = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

issn = "0737-5921",

publisher = "Society of Plastics Engineers",

note = "46th Annual Technical Conference Proceedings ; Conference date: 03-05-2003 Through 08-05-2003",

}

TY - JOUR

T1 - Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control

AU - Hilfiker, J. N.

AU - Johs, B.

AU - Hale, J.

AU - Herzinger, C. M.

AU - Tiwald, T. E.

AU - Bungay, C. L.

AU - Synowicki, R. A.

AU - Pribil, G. K.

AU - Woollam, J. A.

PY - 2003

Y1 - 2003

N2 - Spectroscopic Ellipsometry (SE) has become a routine characterization technique for many coatings and substrate materials. It allows non-contact and nondestructive measurement of film thickness and complex index of refraction. New instrumentation has focused on measurement accuracy, speed, and spectral coverage. This includes extension of SE into the vacuum ultraviolet and infrared. Software advances have led to integration of SE for real-time monitoring (in situ) and control of both deposition and etch processes. In situ characterization provides many advantages for optically variable coatings or multi-layer stacks. Advancement in the area of anisotropic modeling has led to characterization of anisotropic polymers used in liquid crystal displays and web coating. This talk will survey the most recent SE developments.

AB - Spectroscopic Ellipsometry (SE) has become a routine characterization technique for many coatings and substrate materials. It allows non-contact and nondestructive measurement of film thickness and complex index of refraction. New instrumentation has focused on measurement accuracy, speed, and spectral coverage. This includes extension of SE into the vacuum ultraviolet and infrared. Software advances have led to integration of SE for real-time monitoring (in situ) and control of both deposition and etch processes. In situ characterization provides many advantages for optically variable coatings or multi-layer stacks. Advancement in the area of anisotropic modeling has led to characterization of anisotropic polymers used in liquid crystal displays and web coating. This talk will survey the most recent SE developments.

KW - Film thickness

KW - Index of refraction

KW - Monitoring (in-situ)

KW - Web coating process monitoring

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M3 - Conference article

AN - SCOPUS:0242290409

SN - 0737-5921

SP - 365

EP - 370

JO - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

JF - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

T2 - 46th Annual Technical Conference Proceedings

Y2 - 3 May 2003 through 8 May 2003

ER -

Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control

Abstract

Keywords

ASJC Scopus subject areas

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