Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control

J. N. Hilfiker, B. Johs, J. Hale, C. M. Herzinger, T. E. Tiwald, C. L. Bungay, R. A. Synowicki, G. K. Pribil, J. A. Woollam

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

Spectroscopic Ellipsometry (SE) has become a routine characterization technique for many coatings and substrate materials. It allows non-contact and nondestructive measurement of film thickness and complex index of refraction. New instrumentation has focused on measurement accuracy, speed, and spectral coverage. This includes extension of SE into the vacuum ultraviolet and infrared. Software advances have led to integration of SE for real-time monitoring (in situ) and control of both deposition and etch processes. In situ characterization provides many advantages for optically variable coatings or multi-layer stacks. Advancement in the area of anisotropic modeling has led to characterization of anisotropic polymers used in liquid crystal displays and web coating. This talk will survey the most recent SE developments.

Original languageEnglish (US)
Pages (from-to)365-370
Number of pages6
JournalProceedings, Annual Technical Conference - Society of Vacuum Coaters
StatePublished - 2003
Event46th Annual Technical Conference Proceedings - San Francisco, CA, United States
Duration: May 3 2003May 8 2003

Keywords

  • Film thickness
  • Index of refraction
  • Monitoring (in-situ)
  • Web coating process monitoring

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Fluid Flow and Transfer Processes
  • Surfaces, Coatings and Films

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