Removal of submicron particles from nickel-phosphorus surfaces by pulsed laser irradiation

Y. F. Lu, W. D. Song, K. D. Ye, M. H. Hong, D. M. Liu, D. S.H. Chan, T. S. Low

Research output: Contribution to journalArticlepeer-review

20 Scopus citations

Abstract

Pulsed laser cleaning was demonstrated to be an efficient way for removing submicron particles from the nickel-phosphorus (NiP) surface both experimentally and theoretically. Experimentally, it is found that using KrF excimer laser with a pulse width of 23 ns the cleaning threshold is about 20 mJ/cm 2 for removing quartz particles from the NiP surface and laser cleaning efficiency increases rapidly with increasing laser fluence. The theoretical analysis shows that the peak cleaning force (per unit area) is larger than the adhesion force (per unit area) for submicron quartz particles on the NiP surface when it is irradiated by excimer laser with a fluence above 10 mJ/cm 2 . Therefore, it is possible to remove submicron quartz particles from NiP surfaces by laser irradiation. The difference between the cleaning force (per unit area) and the adhesion force (per unit area) increases with increasing laser fluence, leading to a higher cleaning efficiency for quartz particles on the NiP surface.

Original languageEnglish (US)
Pages (from-to)317-322
Number of pages6
JournalApplied Surface Science
Volume120
Issue number3-4
DOIs
StatePublished - Dec 1997
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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