Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers

Xiang Gao; Darin W. Glenn; Scott Heckens; Daniel W. Thompson; John A. Woollam

doi:10.1063/1.366188

Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers

Xiang Gao, Darin W. Glenn, Scott Heckens, Daniel W. Thompson, John A. Woollam

Electrical & Computer Engineering

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.

Original language	English (US)
Pages (from-to)	4525-4531
Number of pages	7
Journal	Journal of Applied Physics
Volume	82
Issue number	9
DOIs	https://doi.org/10.1063/1.366188
State	Published - Nov 1 1997

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.366188

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abstract = "Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.",

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AU - Gao, Xiang

AU - Glenn, Darin W.

AU - Heckens, Scott

AU - Thompson, Daniel W.

AU - Woollam, John A.

PY - 1997/11/1

Y1 - 1997/11/1

N2 - Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.

AB - Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.

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Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers

Abstract

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