Spectroscopic ellipsometry characterization of SiNx antireflection films on textured multicrystalline and monocrystalline silicon solar cells

M. F. Saenger, J. Sun, M. Schädel, J. Hilfiker, M. Schubert, J. A. Woollam

Research output: Contribution to journalArticle

19 Scopus citations

Abstract

We present a spectroscopic ellipsometry study of silicon nitride based antireflection films deposited on chemically textured multi- and monocrystalline silicon wafers. The ellipsometric parameters were measured from the near infrared to the ultra violet spectral region. We report the effective thickness and complex index of refraction parameters of the antireflection films from all studied surfaces, regardless of their microscopic morphology. We report on a method to make ellipsometric measurements of the effective optical constants and thickness parameters of thin films deposited on alkaline etched (100)-oriented monocrystalline silicon. The effect of the texture on the complex index of refraction can be described within an effective medium approximation approach. The optical properties are consistent with those obtained from a series of reference films deposited on flat silicon surfaces.

Original languageEnglish (US)
Pages (from-to)1830-1834
Number of pages5
JournalThin Solid Films
Volume518
Issue number7
DOIs
StatePublished - Jan 31 2010

Keywords

  • Antireflective coating
  • Ellipsometry
  • Solar cells
  • Texture

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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