Sputtering pressure effects and temperature-dependent magnetism of Co/Pd multilayers

S. Y. Jeong, Z. S. Shan, P. He, J. X. Shen, Y. B. Zhang, J. A. Woollam, D. J. Sellmyer

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Abstract

The temperature dependence of the sputtering Ar pressure effects on magnetic properties and the coercivity mechanism of Co(2 Å)/Pd(13 Å) multilayers were studied as the sputtering Ar pressure varied from 3-15 mTorr and the temperature from 300 to 35 K. It is found that the roughness of the interfaces or film surface increases with increasing sputtering pressure, the anisotropy increases with decreasing temperature and increasing Ar pressure and shows a maximum at PAr≊12 mTorr, and the coercivity increases with Ar pressure and shows stronger temperature dependence at higher Ar pressure. The coercivity mechanism was analyzed in terms of the coercivity predicted by Kronmüller's theory [Phys. Status Solidi B 144, 385 (1987)]. Wall pinning is found to be the main mechanism and the size of the pinning site increases slightly as the Ar pressure increases.

Original languageEnglish (US)
Pages (from-to)6084-6086
Number of pages3
JournalJournal of Applied Physics
Volume76
Issue number10
DOIs
StatePublished - Dec 1 1994

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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