Steam laser cleaning of nanoparticles from silicon substrates

N. Batta, Y. F. Lu, D. W. Doerr, D. R. Alexander

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Cleaning efficiency dependence on various material types of nanoparticles in steam laser cleaning of silicon substrates will be presented. Nanoparticles, including alumina and titanium carbide were deposited on silicon substrates. A KrF excimer laser with a wavelength of 248 nm was used to irradiate the substrates in laser cleaning. A water steam layer of micrometer thickness was deposited on silicon substrates to improve the cleaning process. Cleaning efficiency was measured for different laser fluences ranging from 50 to 250 mJ/cm2 and pulse numbers from 1 to 100. Scanning electron micrographs of silicon samples before and after laser cleaning were used to calculate the cleaning efficiency. Ultrafast photodetector was used to monitor the water steam deposition and removal in the steam laser cleaning process.

Original languageEnglish (US)
Title of host publicationICALEO 2004 - 23rd International Congress on Applications of Laser and Electro-Optics, Congress Proceedings
StatePublished - 2004
EventICALEO 2004 - 23rd International Congress on Applications of Laser and Electro-Optics - San Francisco, CA, United States
Duration: Oct 4 2004Oct 7 2004

Publication series

NameICALEO 2004 - 23rd International Congress on Applications of Laser and Electro-Optics, Congress Proceedings

Conference

ConferenceICALEO 2004 - 23rd International Congress on Applications of Laser and Electro-Optics
CountryUnited States
CitySan Francisco, CA
Period10/4/0410/7/04

ASJC Scopus subject areas

  • Geochemistry and Petrology
  • Electrical and Electronic Engineering

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