Abstract
An overview is given of our recent progress in controlling the microstructure of magnetic films through process control of the sputter deposition conditions. Two thin film systems are considered: (1) hard disk magnetic recording media candidate - Sm-Co dc-sputtered on a Cr underlayer; and (2) a nanocomposite - rf-sputtered Fe:SiO 2. The influence of the sputter pressure and thickness of the deposited layers on the microstructure and magnetic properties is discussed. The role of high spatial resolution electron microscopy characterization studies is emphasized.
| Original language | English (US) |
|---|---|
| Title of host publication | Materials Science Forum |
| Publisher | Trans Tech Publ |
| Pages | 603-608 |
| Number of pages | 6 |
| Volume | 179-181 |
| State | Published - 1995 |
| Event | Proceedings of the International Symposium on Metastable, Mechanically Alloyed and Nanocrystalline Materials - Grenoble, Fr Duration: Jun 27 1994 → Jul 1 1994 |
Other
| Other | Proceedings of the International Symposium on Metastable, Mechanically Alloyed and Nanocrystalline Materials |
|---|---|
| City | Grenoble, Fr |
| Period | 6/27/94 → 7/1/94 |
ASJC Scopus subject areas
- General Materials Science