Structure, property, processing relationships in nanocrystalline sputtered magnetic films

B. W. Robertson, Y. Liu, Z. S. Shan, S. H. Liou, D. J. Sellmyer

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

An overview is given of our recent progress in controlling the microstructure of magnetic films through process control of the sputter deposition conditions. Two thin film systems are considered: (1) hard disk magnetic recording media candidate - Sm-Co dc-sputtered on a Cr underlayer; and (2) a nanocomposite - rf-sputtered Fe:SiO 2. The influence of the sputter pressure and thickness of the deposited layers on the microstructure and magnetic properties is discussed. The role of high spatial resolution electron microscopy characterization studies is emphasized.

Original languageEnglish (US)
Title of host publicationMaterials Science Forum
PublisherTrans Tech Publ
Pages603-608
Number of pages6
Volume179-181
StatePublished - 1995
EventProceedings of the International Symposium on Metastable, Mechanically Alloyed and Nanocrystalline Materials - Grenoble, Fr
Duration: Jun 27 1994Jul 1 1994

Other

OtherProceedings of the International Symposium on Metastable, Mechanically Alloyed and Nanocrystalline Materials
CityGrenoble, Fr
Period6/27/947/1/94

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ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Robertson, B. W., Liu, Y., Shan, Z. S., Liou, S. H., & Sellmyer, D. J. (1995). Structure, property, processing relationships in nanocrystalline sputtered magnetic films. In Materials Science Forum (Vol. 179-181, pp. 603-608). Trans Tech Publ.