Abstract
The m-plane oriented gallium nitride (GaN) nanoplates were successfully grown on silicon (Si) substrates using laser-assisted metal organic chemical vapor deposition (L-MOCVD). The morphology and>1010< orientation of the nanoplates were confirmed using scanning electron microscope and transmission electron microscope. The strong A1 (TO) mode of Raman spectra and (1010) peak of X-ray diffraction pattern confirmed the m-plane orientation of the GaN nanoplates. The repeated growth on the c- and m-plane of nanoplates resulted in the formation of interlinked GaN nanoplate networks. Our results suggest that L-MOCVD is a promising technique for the rapid growth of m-plane oriented GaN nanoplates on the Si substrates at low growth temperatures.
Original language | English (US) |
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Pages | 888-892 |
Number of pages | 5 |
DOIs | |
State | Published - 2013 |
Event | 32nd International Congress on Applications of Lasers and Electro-Optics, ICALEO 2013 - Miami, FL, United States Duration: Oct 6 2013 → Oct 10 2013 |
Conference
Conference | 32nd International Congress on Applications of Lasers and Electro-Optics, ICALEO 2013 |
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Country/Territory | United States |
City | Miami, FL |
Period | 10/6/13 → 10/10/13 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials