TY - JOUR
T1 - Temperature-dependent void formation and growth at ion-irradiated nanocrystalline CeO2-Si interfaces
AU - Perez-Bergquist, Alejandro G.
AU - Zhang, Yanwen
AU - Varga, Tamas
AU - Moll, Sandra
AU - Namavar, Fereydoon
AU - Weber, William J.
N1 - Funding Information:
This research was performed using funding received from the DOE Office of Nuclear Energy’s Nuclear Energy University Programs. A portion of research was performed at the Environmental Molecular Sciences Laboratory (EMSL), a national scientific user facility sponsored by the Department of Energy’s Office of Biological and Environmental Research located at Pacific Northwest National Laboratory.
PY - 2014/4/15
Y1 - 2014/4/15
N2 - Ceria is a thermally stable ceramic that has numerous applications in the nuclear industry, including use in nuclear fuels and waste forms. Recently, interest has surged in nanostructured ceria due to its increased mechanical properties and electronic conductivity in comparison with bulk ceria and its ability to self-heal in response to energetic ion bombardment. Here, nanocrystalline ceria thin films grown over a silicon substrate are irradiated to fluences of up to ∼4 × 1016 ions/cm2 under different irradiation conditions: with differing ion species (Si+ and Ni+), different ion energies (1.0-1.5 MeV), and at varying temperatures (160-600 K). While the nanocrystalline ceria is found to exhibit exceptional radiation resistance under all tested conditions, severe ion irradiation-induced mixing, void formation, and void growth are observed at the ceria/silicon interface, with the degree of damage proving to be temperature dependent.
AB - Ceria is a thermally stable ceramic that has numerous applications in the nuclear industry, including use in nuclear fuels and waste forms. Recently, interest has surged in nanostructured ceria due to its increased mechanical properties and electronic conductivity in comparison with bulk ceria and its ability to self-heal in response to energetic ion bombardment. Here, nanocrystalline ceria thin films grown over a silicon substrate are irradiated to fluences of up to ∼4 × 1016 ions/cm2 under different irradiation conditions: with differing ion species (Si+ and Ni+), different ion energies (1.0-1.5 MeV), and at varying temperatures (160-600 K). While the nanocrystalline ceria is found to exhibit exceptional radiation resistance under all tested conditions, severe ion irradiation-induced mixing, void formation, and void growth are observed at the ceria/silicon interface, with the degree of damage proving to be temperature dependent.
KW - Ceria
KW - Ion irradiation
KW - Transmission electron microscopy
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U2 - 10.1016/j.nimb.2014.02.012
DO - 10.1016/j.nimb.2014.02.012
M3 - Article
AN - SCOPUS:84896763135
VL - 325
SP - 66
EP - 72
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
ER -