The fabrication of TiNi thin films by pulsed-laser deposition

Xiaoyu Chen, Yongfeng Lu, Zhongmin Ren, Sha Zhu

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


TiNi shape memory alloy (SMA) thin films have been fabricated by pulsed-laser deposition (PLD) at different substrate temperatures. The stoichiometry, surface morphology and crystallinity of the films were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and X-ray diffraction (XRD). The transformation behaviour and crystallization temperatures were investigated by differential scanning calorimetry (DSC). It is found that the Ni content of the deposited films ranges from 46.7 to 52.0 at.%. The films deposited at low temperature are amorphous. The crystallization temperature of the Ti-51.5 at.% Ni thin film is 449°C. The martensitic transformation temperature of the film is -20.8°C.

Original languageEnglish (US)
Pages (from-to)225-228
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 2002
Externally publishedYes


  • Laser ablation
  • PLD
  • Shape memory alloy
  • Thin film
  • TiNi

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


Dive into the research topics of 'The fabrication of TiNi thin films by pulsed-laser deposition'. Together they form a unique fingerprint.

Cite this