The synthesis, characterization, and photochemical crosslinking of an NLO epoxy polymer

T. Goodson; J. M. Takacs; C. H. Wang; L. Zhang

doi:10.1142/S0218863596000283

The synthesis, characterization, and photochemical crosslinking of an NLO epoxy polymer

T. Goodson, J. M. Takacs, C. H. Wang, L. Zhang

Chemistry

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

A photocrosslinkable second order nonlinear optical (NLO) epoxy polymer, Bisphenol A-Nitroaminotolane, containing covalently attached cinnamate side chain substituents (BisA-NAT-CM), was synthesized. After corona poling Second Harmonic Generation (SHG) is used to measure the relaxation of the anisotropy after the electric field is removed. Upon photolysis at 260 nm the cinnamoyl side chains undergo photochemical dimerization to crosslink the NLO polymer. Photobleaching is not a problem under these conditions. The photocrosslinked NLO polymer shows virtually no relaxation over a period of 500 hours at room temperature and good temporal stability at temperatures as high as 110°C.

Original language	English (US)
Pages (from-to)	437-446
Number of pages	10
Journal	Journal of Nonlinear Optical Physics and Materials
Volume	5
Issue number	2
DOIs	https://doi.org/10.1142/S0218863596000283
State	Published - Apr 1996

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Physics and Astronomy (miscellaneous)

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title = "The synthesis, characterization, and photochemical crosslinking of an NLO epoxy polymer",

abstract = "A photocrosslinkable second order nonlinear optical (NLO) epoxy polymer, Bisphenol A-Nitroaminotolane, containing covalently attached cinnamate side chain substituents (BisA-NAT-CM), was synthesized. After corona poling Second Harmonic Generation (SHG) is used to measure the relaxation of the anisotropy after the electric field is removed. Upon photolysis at 260 nm the cinnamoyl side chains undergo photochemical dimerization to crosslink the NLO polymer. Photobleaching is not a problem under these conditions. The photocrosslinked NLO polymer shows virtually no relaxation over a period of 500 hours at room temperature and good temporal stability at temperatures as high as 110°C.",

author = "T. Goodson and Takacs, {J. M.} and Wang, {C. H.} and L. Zhang",

year = "1996",

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language = "English (US)",

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T1 - The synthesis, characterization, and photochemical crosslinking of an NLO epoxy polymer

AU - Goodson, T.

AU - Takacs, J. M.

AU - Wang, C. H.

AU - Zhang, L.

PY - 1996/4

Y1 - 1996/4

N2 - A photocrosslinkable second order nonlinear optical (NLO) epoxy polymer, Bisphenol A-Nitroaminotolane, containing covalently attached cinnamate side chain substituents (BisA-NAT-CM), was synthesized. After corona poling Second Harmonic Generation (SHG) is used to measure the relaxation of the anisotropy after the electric field is removed. Upon photolysis at 260 nm the cinnamoyl side chains undergo photochemical dimerization to crosslink the NLO polymer. Photobleaching is not a problem under these conditions. The photocrosslinked NLO polymer shows virtually no relaxation over a period of 500 hours at room temperature and good temporal stability at temperatures as high as 110°C.

AB - A photocrosslinkable second order nonlinear optical (NLO) epoxy polymer, Bisphenol A-Nitroaminotolane, containing covalently attached cinnamate side chain substituents (BisA-NAT-CM), was synthesized. After corona poling Second Harmonic Generation (SHG) is used to measure the relaxation of the anisotropy after the electric field is removed. Upon photolysis at 260 nm the cinnamoyl side chains undergo photochemical dimerization to crosslink the NLO polymer. Photobleaching is not a problem under these conditions. The photocrosslinked NLO polymer shows virtually no relaxation over a period of 500 hours at room temperature and good temporal stability at temperatures as high as 110°C.

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JO - Journal of Nonlinear Optical Physics and Materials

JF - Journal of Nonlinear Optical Physics and Materials

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The synthesis, characterization, and photochemical crosslinking of an NLO epoxy polymer

Abstract

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