TY - JOUR
T1 - The temporal-spatial evolution of electron dynamics induced by femtosecond double pulses
AU - Pan, Changji
AU - Jiang, Lan
AU - Sun, Jingya
AU - Wang, Qingsong
AU - Wang, Feifei
AU - Lu, Yongfeng
N1 - Funding Information:
Acknowledgments This research was supported by the National Key R&D Program of China (Grant No. 2017YFB1104300) and National Natural Science Foundation of China (Grant No. 11704028).
Publisher Copyright:
© 2019 The Japan Society of Applied Physics.
PY - 2019/3/1
Y1 - 2019/3/1
N2 - The temporal and spatial electron dynamics were investigated under irradiation of temporally shaped femtosecond double pulses. Filament split was observed upon arrival of the second pulse, which was attributed to the emergence of transient high-reflective surface induced by the first pulse. The electron density analysis showed that the total deposition energy of double pulses case was generally higher than that of single pulse case. Particularly, the maximum deposition energy was obtained at 350 fs separation time of double pulses. The results of our experiment demonstrated optimization of energy deposition efficiency by temporally shaping laser pulses, which will benefit the fabrication process.
AB - The temporal and spatial electron dynamics were investigated under irradiation of temporally shaped femtosecond double pulses. Filament split was observed upon arrival of the second pulse, which was attributed to the emergence of transient high-reflective surface induced by the first pulse. The electron density analysis showed that the total deposition energy of double pulses case was generally higher than that of single pulse case. Particularly, the maximum deposition energy was obtained at 350 fs separation time of double pulses. The results of our experiment demonstrated optimization of energy deposition efficiency by temporally shaping laser pulses, which will benefit the fabrication process.
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U2 - 10.7567/1347-4065/ab00a8
DO - 10.7567/1347-4065/ab00a8
M3 - Article
AN - SCOPUS:85063337137
VL - 58
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
SN - 0021-4922
IS - 3
M1 - 030901
ER -