Silicon oxide layers locally deposited on ferrite were analyzed by microprobe RBS and PIXE with 1.5 MeV protons. Surface distribution of the deposited lines was found to be uniform by an RBS-mapping image in spite of a nonuniform image in a secondary-electron measurement. A thickness of the deposited layer could be nondestructively estimated by a combination of RBS and PIXE mapping images.
ASJC Scopus subject areas
- Nuclear and High Energy Physics