Three-dimensional analysis of locally deposited silicon oxide on ferrite by a combination of microprobe RBS and PIXE

A. Kinomura, Y. Horino, Y. Mokuno, A. Chayahara, M. Kiuchi, K. Fujii, M. Takai, Y. F. Lu

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

Silicon oxide layers locally deposited on ferrite were analyzed by microprobe RBS and PIXE with 1.5 MeV protons. Surface distribution of the deposited lines was found to be uniform by an RBS-mapping image in spite of a nonuniform image in a secondary-electron measurement. A thickness of the deposited layer could be nondestructively estimated by a combination of RBS and PIXE mapping images.

Original languageEnglish (US)
Pages (from-to)689-692
Number of pages4
JournalNuclear Inst. and Methods in Physics Research, B
Volume85
Issue number1-4
DOIs
StatePublished - Mar 2 1994

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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